Corial - Kayen High-Density Radical Flux (HDRF) System
Corial's Kayen HDRF is a unique plasma-based system for photoresist removal and wafer surface treatment. It is the most efficient and cost-effective system available for microelectronics manufacturing today.
Unlike conventional photoresist strip systems, Corial utilizes High-Density Radical Flux (HDRF) technology which produces high concentrations of reactive radicals, without charged particles or unwanted photons. This chemical (non-physical), non-damaging plasma is ideal for conventional and low-temperature applications. Kayen HDRF™ is likewise designed for batch processing and can be easily reconfigured for single wafers. Key applications and features include:
- Low-temperature (50˚C to 150˚C) photoresist removal
- High-rate (150˚C to 250˚C) photoresist removal
- Surface organic cleaning
- Sacrificial polymer release for MEMS devices
- HDRF™ ICP plasma source delivers high-density, damage-free plasma
- 13.56MHz RF package with automatic impedance-matching network
- Heated, barrel-style process chamber
- High-conductance vacuum train with VAT™ throttle valve
- Up to five gas channels (two included) with digital MFCs
- Manual loading and easily configurable for single-substrate and multi-substrate processing
Corial's Kayen HDRF is a unique plasma-based system for photoresist removal and wafer surface treatment. It is the most efficient and cost-effective system available for microelectronics manufacturing today.
Unlike conventional photoresist strip systems, Corial utilizes High-Density Radical Flux (HDRF) technology which produces high concentrations of reactive radicals, without charged particles or unwanted photons. This chemical (non-physical), non-damaging plasma is ideal for conventional and low-temperature applications. Kayen HDRF™ is likewise designed for batch processing and can be easily reconfigured for single wafers. Key applications and features include:
- Low-temperature (50˚C to 150˚C) photoresist removal
- High-rate (150˚C to 250˚C) photoresist removal
- Surface organic cleaning
- Sacrificial polymer release for MEMS devices
- HDRF™ ICP plasma source delivers high-density, damage-free plasma
- 13.56MHz RF package with automatic impedance-matching network
- Heated, barrel-style process chamber
- High-conductance vacuum train with VAT™ throttle valve
- Up to five gas channels (two included) with digital MFCs
- Manual loading and easily configurable for single-substrate and multi-substrate processing
Corial's Kayen HDRF is a unique plasma-based system for photoresist removal and wafer surface treatment. It is the most efficient and cost-effective system available for microelectronics manufacturing today.
Unlike conventional photoresist strip systems, Corial utilizes High-Density Radical Flux (HDRF) technology which produces high concentrations of reactive radicals, without charged particles or unwanted photons. This chemical (non-physical), non-damaging plasma is ideal for conventional and low-temperature applications. Kayen HDRF™ is likewise designed for batch processing and can be easily reconfigured for single wafers. Key applications and features include:
- Low-temperature (50˚C to 150˚C) photoresist removal
- High-rate (150˚C to 250˚C) photoresist removal
- Surface organic cleaning
- Sacrificial polymer release for MEMS devices
- HDRF™ ICP plasma source delivers high-density, damage-free plasma
- 13.56MHz RF package with automatic impedance-matching network
- Heated, barrel-style process chamber
- High-conductance vacuum train with VAT™ throttle valve
- Up to five gas channels (two included) with digital MFCs
- Manual loading and easily configurable for single-substrate and multi-substrate processing
This equipment is advertised on behalf of Corial