Corial - 200R Reactive Ion Etching (RIE) Etch System
Simplicity, performance, and upgradability in a system designed for R&D environments.
The Corial 200R is a compact, easy-to-use system for reactive ion etching of silicon-based compounds, metals and polymers. Relatedly, the system is designed for the processing of materials compatible with fluorinated chemistries, including not just silicon compounds but various metals (Ge, W, Ta, TaN, Ti, TiN, TiW, Nb, NbN, Mo) and polymers.
With a direct-load design suitable for wafer pieces, or up to full 200mm wafers, the Corial 200R is the ideal equipment for research and prototyping.
Likewise, the Corial 200R etch tool is customizable, and can be upgraded after installation with an ICP source, load lock, additional gas lines, and other features such as a chamber for sputter-etch functions - the RIE process chamber is designed for etching and/or sputtering of thin films on any kind of substrate.
Simplicity, performance, and upgradability in a system designed for R&D environments.
The Corial 200R is a compact, easy-to-use system for reactive ion etching of silicon-based compounds, metals and polymers. Relatedly, the system is designed for the processing of materials compatible with fluorinated chemistries, including not just silicon compounds but various metals (Ge, W, Ta, TaN, Ti, TiN, TiW, Nb, NbN, Mo) and polymers.
With a direct-load design suitable for wafer pieces, or up to full 200mm wafers, the Corial 200R is the ideal equipment for research and prototyping.
Likewise, the Corial 200R etch tool is customizable, and can be upgraded after installation with an ICP source, load lock, additional gas lines, and other features such as a chamber for sputter-etch functions - the RIE process chamber is designed for etching and/or sputtering of thin films on any kind of substrate.
Simplicity, performance, and upgradability in a system designed for R&D environments.
The Corial 200R is a compact, easy-to-use system for reactive ion etching of silicon-based compounds, metals and polymers. Relatedly, the system is designed for the processing of materials compatible with fluorinated chemistries, including not just silicon compounds but various metals (Ge, W, Ta, TaN, Ti, TiN, TiW, Nb, NbN, Mo) and polymers.
With a direct-load design suitable for wafer pieces, or up to full 200mm wafers, the Corial 200R is the ideal equipment for research and prototyping.
Likewise, the Corial 200R etch tool is customizable, and can be upgraded after installation with an ICP source, load lock, additional gas lines, and other features such as a chamber for sputter-etch functions - the RIE process chamber is designed for etching and/or sputtering of thin films on any kind of substrate.
This equipment is advertised on behalf of Corial